etching mordant - vertaling naar russisch
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etching mordant - vertaling naar russisch

Etching (plasma); Etching (isotropic)

etching mordant      
травящий раствор
acid polishing         
  • An anisotropic wet etch on a silicon wafer creates a cavity with a trapezoidal cross-section.  The bottom of the cavity is a {100} plane (see [[Miller indices]]), and the sides are {111} planes.  The blue material is an etch mask, and the green material is silicon.
  • 140px
  • 140px
  • Etching, simplified animation of etchant action on a copper sheet with mask
  • Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. Note: Not to scale.
TECHNIQUE IN MICROFABRICATION
Etching (microfab); Wafer etching; Chemical polishing; Acid polishing
полирование с использованием кислоты (для травления поверхности)
acid polishing         
  • An anisotropic wet etch on a silicon wafer creates a cavity with a trapezoidal cross-section.  The bottom of the cavity is a {100} plane (see [[Miller indices]]), and the sides are {111} planes.  The blue material is an etch mask, and the green material is silicon.
  • 140px
  • 140px
  • Etching, simplified animation of etchant action on a copper sheet with mask
  • Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. Note: Not to scale.
TECHNIQUE IN MICROFABRICATION
Etching (microfab); Wafer etching; Chemical polishing; Acid polishing

строительное дело

полирование с использованием кислоты (для травления поверхности)

Definitie

etching
¦ noun
1. the art or process of etching.
2. a print produced by etching.

Wikipedia

Isotropic etching

Isotropic etching is a method commonly used in semiconductors to remove material from a substrate via a chemical process using an etchant substance. The etchant may be in liquid-, gas- or plasma-phase, although liquid etchants such as buffered hydrofluoric acid (BHF) for silicon dioxide etching are more often used. Unlike anisotropic etching, isotropic etching does not etch in a single direction, but rather etches in multiple directions within the substrate. Any horizontal component of the etch direction may therefore result in undercutting of patterned areas, and significant changes to device characteristics. Isotropic etching may occur unavoidably, or it may be desirable for process reasons.

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